Titanium Sputtering Targets
The Core Material for High-Precision Thin-Film Deposition
In the realms of semiconductors, optical devices, premium decorative coatings, and renewable energy, a uniform, dense, and high-performance titanium thin film is the cornerstone of product quality and reliability. The essential precursor to achieving these high-performance films is the Titanium Sputtering Target.
As a specialist manufacturer of advanced metallic materials, Ti Time provides global clients with high-purity, customized titanium sputtering targets and integrated thin-film solutions.
What are Titanium Sputtering Targets?
Titanium sputtering targets are high-purity solid materials precision-machined into specific geometries—typically circular discs, rectangular plates, or rotary (tubular) targets. They serve as the critical cathode material within magnetron sputtering systems.
The Working Principle: Inside a high-vacuum chamber, high-energy argon ions bombard the target surface under the influence of an electric field. This causes titanium atoms to be ejected (sputtered) and migrate through the vacuum to deposit onto a substrate—such as silicon wafers, glass, quartz, or metal. The result is an ultra-thin, uniform titanium functional layer essential for modern high-end manufacturing.
Purity and Metallurgy: The Pillars of Performance
Standard industrial-grade titanium cannot meet the rigorous demands of precision coating. Ti Time maintains strict control from raw material purification to final heat treatment, ensuring our targets exceed the most demanding industry standards.
1. Purity Grades
Industrial Grade (99.7%): Ideal for wear-resistant coatings and decorative finishes.
High-Purity Grade (99.99% / 4N & 99.995% / 4N5): Specifically engineered for semiconductors, optics, and photovoltaic applications.
Why Purity Matters: High purity effectively eliminates circuit defects, film discoloration, and conductivity anomalies caused by trace impurities.
2. Microstructural Integrity
Through proprietary precision rolling and heat treatment processes, we achieve a fine, uniform, and stable grain size. This optimizes:
Consistent Sputter Erosion Rates: Ensuring a longer target lifecycle.
Reduced Particle Splashing: Minimizing “nodule” formation and film defects.
Uniform Film Thickness: Guaranteeing reliable performance across the entire substrate.
Versatile Applications: Meeting Global Industry Demands
Titanium films are prized for their high adhesion, hardness, corrosion resistance, and excellent optical properties. Ti Time offers customized targets tailored to specific process environments:
Semiconductor Integrated Circuits: Used as an adhesion layer and diffusion barrier, titanium enhances the bond between metal wiring and silicon substrates, ensuring chip reliability.
Optical Thin Films: Leveraged for its specific refractive index in multi-layer optical structures, such as interference coatings, anti-reflective (AR) coatings, and optical filters.
Premium Decorative & Wear-Resistant Coatings: Through reactive sputtering, titanium creates Titanium Nitride (TiN) and other hard, gold-toned films widely used in luxury watches, hardware, cutting tools, and molds.
Renewable Energy & Photovoltaics: Essential for conductive back electrodes in solar cells and functional layers in transparent conductive oxides (TCO), enhancing photoelectric conversion efficiency.
Why Partner with Ti Time?
We bridge the gap between premium raw material supply chains and precision machining, offering stable, reliable, and fully traceable one-stop target solutions.
Full-Scale Customization: From 2-inch R&D targets to 8-inch (and larger) industrial-scale magnetron targets. We support standard thicknesses (0.125″–0.25″) as well as non-standard geometries, stepped targets, and bonded assemblies.
Advanced Backing Plate Bonding: We offer Indium Bonding and Elastomer Bonding services to securely join titanium targets to copper backing plates. This maximizes thermal dissipation and structural integrity for high-power, continuous sputtering.
End-to-End Traceability: Every batch is accompanied by a comprehensive COA (Certificate of Analysis), documenting purity, impurity levels, density, and hardness.
Combining high-purity metallurgical expertise with precision machining and deep industry experience, Ti Time is a premier supplier of titanium sputtering targets for the semiconductor, optical, and high-end manufacturing sectors.
From R&D prototyping to high-volume industrial supply, we are your trusted long-term partner in thin-film excellence.